Physique
Permanent URI for this collection
Browse
Browsing Physique by Subject "spray pyrolysis"
Now showing 1 - 1 of 1
Results Per Page
Sort Options
Item Study of the structural, optical, and electrical properties of copper oxide thin films undoped and doped(University of 20 aout 1955-Skikda, 2024-05-09) ZEROUALI, Madiha; Daira, RadouaneIn this study, copper oxide thin films undoped and doped were elaborated by two methods: pneumatic spray pyrolysis and sol-gel spin coating on a glass substrate, and used in two applications: self-cleaning and photocatalytic, respectively. All the samples are characterized by X-ray diffraction, FT-IR spectroscopy, scanning electron microscope, energy-dispersive Xray, UV-visible spectrophotometry, and four-point method. Undoped CuO layers were made by spray pyrolysis for different spray times. The XRD analysis of these layers showed that the films have a monoclinic structure (tenorite) and a preferential growth in the (111) direction. According to Scherer's formula the crystallite size is nanometric between 14 – 23nm. The water contact angle values in all samples are greater than 90° and range from 96.4° to 103.2°, as we can see from these results that all the samples are hydrophobic films and excellent in a selfcleaning application. Thin films of copper oxide undoped and doped with aluminum and silver (5%, 15%, 25 %, and 50%) were deposited by the sol-gel spin coating method on a glass substrate. According to XRD diffraction and by Williamson-Hall plot method, the crystallite size varies between 21– 46 nm and 21– 33 nm and increases with the increase in Al and Ag doping, respectively. The electrical conductivity values increase with the presence of doping. Aluminum doping has good structural and electrical properties when compared to elemental silver. The Photocatalysis results showed that doping of copper oxide by (Al) improves the photocatalytic efficiency, and the best degradation of a dye (orange II) under UV irradiation after 5 hours reaches 61% for the use for thin layers of CuO doped with 50% Al.